Ellipsometric in situ measurement of oxidation kinetics and thickness of (C2–C20) alkylsilyl (sub)monolayers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2832439
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4. Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111);Applied Physics A;2011-06-08
5. Controlled stepwise growth of siloxane chains using bivalent building units with different functionalities;Thin Solid Films;2010-07
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