Time-resolved monitoring of cavitation activity in megasonic cleaning systems
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3697710
Reference39 articles.
1. Ultraclean Surface Processing of Silicon Wafers
2. Investigation of Physical Cleaning Process Window by Atomic Force Microscope
3. Mechanism of particle removal by megasonic waves
4. Evaluation of Megasonic Cleaning for Sub-90nm Technologies
5. Megasonics: A Cavitation Driven Process
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