Low energy electron irradiation induced carbon etching: Triggering carbon film reacting with oxygen from SiO2 substrate-Reference-Cited by-同舟云学术

Low energy electron irradiation induced carbon etching: Triggering carbon film reacting with oxygen from SiO2 substrate

Published:2016-08 Issue:5 Volume:109 Page:053104
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Chen Cheng¹²,Wang Chao¹,Diao Dongfeng¹

Affiliation:

1. Institute of Nanosurface Science and Engineering (INSE), Shenzhen University, Shenzhen 518060, China

2. Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China

Funder

National Natural Science Foundation of China (NSFC)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4960194

Reference33 articles.

1. Carbon nanomaterials for electronics, optoelectronics, photovoltaics, and sensing

2. History of diamond-like carbon films — From first experiments to worldwide applications

3. Graphene nanosheet: synthesis, molecular engineering, thin film, hybrids, and energy and analytical applications

4. Magnetic behavior of graphene sheets embedded carbon film originated from graphene nanocrystallite

5. Transmission electron microscopy and electron energy loss spectroscopy analysis of ultrathin amorphous carbon films

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