Ionization Processes on Tungsten Filaments II. The Absorption of Fluorine on Tungsten
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1746996
Reference4 articles.
1. Ionization Processes on Tungsten Filaments I. The Electron Affinity of the Oxygen Atom
2. Thermodynamic Properties of Hydrogen Fluoride and Fluorine from Spectroscopic Data
3. Die Gitterenergie der Alkalihalogenide und die Elektronenaffinit�t der Halogene
4. Die Gitterenergie der Alkalihalogenide und die Elektronenaffinit�t der Halogene
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1. Account: Surface ionization organic mass spectrometry: mechanism;European Journal of Mass Spectrometry;1996
2. Deposition Fundamentals and Properties of Metallic and Diffusion Barrier Films;Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices;1993
3. Growth kinetics of tungsten microstructures produced via the hydrogen reduction of tungsten hexafluoride on laser‐heated substrates;Journal of Applied Physics;1992-05
4. Efficient emitters for surface ionization organic mass spectrometry;International Journal of Mass Spectrometry and Ion Processes;1989-01
5. Kinetics and Mechanism of Selective Tungsten Deposition by LPCVD;Journal of The Electrochemical Society;1985-11-01
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