Affiliation:
1. 1Plasma Science and Technology Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India
2. 2Department of Physics, MM Engineering College, Maharishi Markandeshwar University, Mullana-Ambala, Haryana, India 133207
Abstract
The sheath formation mechanism is modeled in a four-component collisional electronegative warm plasma considering the behavior of positive ions by fluid equations and of negative ions by the Boltzmann distribution, along with non-extensive distributions of hot and cold electrons. For a more realistic situation, the ion source term and the ionization rate are also included in the basic equations that are solved numerically by applying appropriate boundary conditions. A concept of sheath thickness measurement is established based on two approaches, namely, the zero-electron-density approach and the floating potential approach. An identical behavior of the sheath thickness is observed based on these approaches, which means that the floating potential approach confirms the efficacy of the zero-electron-density approach. Finally, the effects of various parameters such as the temperature of all the plasma species, collisions, ionization rate, and non-extensivity are evaluated on the profiles of the densities of plasma species, electric potential, and net space charge density for better understanding of the sheath formation mechanism. In comparison to electropositive plasma, a sharp fall in the potential for the case of electronegative plasma has been depicted, or in other words, higher potential gradient is realized in the electronegative plasma. Also, increasing negative ion temperature results in the reduced sheath thickness and produces a stronger gradient in the potential.
Funder
Council of Scientific and Industrial Research, India
Subject
General Physics and Astronomy
Cited by
4 articles.
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