Chemically vapor deposited Eu3+:Y2O3 thin films as a material platform for quantum technologies-Reference-Cited by-同舟云学术

Chemically vapor deposited Eu3+:Y2O3 thin films as a material platform for quantum technologies

Published:2020-08-07 Issue:5 Volume:128 Page:055304
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Harada Nao¹^ORCID,Ferrier Alban¹²^ORCID,Serrano Diana¹^ORCID,Persechino Mauro¹,Briand Emrick³,Bachelet Romain⁴^ORCID,Vickridge Ian³^ORCID,Ganem Jean-Jacques³,Goldner Philippe¹,Tallaire Alexandre¹

Affiliation:

1. Chimie ParisTech, PSL University, CNRS, Institut de Recherche de Chimie Paris, Paris 75005, France

2. Faculté des Sciences et Ingénierie, Sorbonne Universités, UFR 933, Paris 75005, France

3. INSP, Sorbonne Universités, UPMC Université Paris 6, CNRS, UMR 7588, Paris, France

4. INL, Université de Lyon, Ecole Centrale de Lyon, CNRS UMR 5270, 69134 Ecully, France

Funder

European Union's Horizon 2020 research and innovation programme

SIRTEQ

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0010833

Reference51 articles.

1. The quantum technologies roadmap: a European community view

2. Ultraslow optical dephasing inEu3+:Y2SiO5

3. P. Goldner, A. Ferrier, and O. Guillot-Noel, in Handbook on Physics and Chemistry of Rare-Earth Materials, edited by J.C. Bunzli and V. Pecharsky (Elsevier, 2015), pp. 1–78.

4. Spectroscopy and coherence lifetime extension of hyperfine transitions in151Eu3+:Y2SiO5

5. Optically addressable nuclear spins in a solid with a six-hour coherence time

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