Nanoscale η-NiSi formation via ion irradiation of Si/Ni/Si-Reference-Cited by-同舟云学术

Nanoscale η-NiSi formation via ion irradiation of Si/Ni/Si

Published:2017-01-28 Issue:4 Volume:121 Page:045302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Banu Nasrin¹,Satpati Biswarup²^ORCID,Bhukta Anjan³,Dev B. N.¹

Affiliation:

1. Department of Materials Science, Indian Association for the Cultivation of Science, 2A & 2B Raja S. C. Mullick Road, Jadavpur, Kolkata 700032, India

2. Surface Physics and Material Science Division, Saha Institute of Nuclear Physics, 1/AF, Bidhannagar, Kolkata 700064, India

3. Institute of Physics, Sachivalaya Marg, Bhubaneswar 751005, India

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4974456

Reference22 articles.

1. Metal Silicides in CMOS Technology: Past, Present, and Future Trends

2. Ni- and Co-based silicides for advanced CMOS applications

3. Silicide Technology for Integrated Circuits

4. Endotaxial silicide nanowires: A review

5. Nanodot to nanowire: A strain-driven shape transition in self-organized endotaxial CoSi2 on Si(100)

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3. Towards x-ray waveguide formation upon ion irradiation of a Co thin film on Si(111);Materials Research Express;2019-02-22

4. Oscillatory magnetic behavior in an ion-irradiated Si/Ni/Si sandwich system;Physica B: Condensed Matter;2018-12