A novel method to form conducting channels in SiOx(Si) films for field emission application
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3273394
Reference49 articles.
1. Vacuum Microelectronics
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5. Electropolishing Silicon in Hydrofluoric Acid Solutions
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