Critical tensile strain and water vapor transmission rate for nanolaminate films grown using Al2O3 atomic layer deposition and alucone molecular layer deposition-Reference-Cited by-同舟云学术

Critical tensile strain and water vapor transmission rate for nanolaminate films grown using Al2O3 atomic layer deposition and alucone molecular layer deposition

Published:2012-12-03 Issue:23 Volume:101 Page:234103
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Jen Shih-Hui,Lee Byoung H.,George Steven M.,McLean Robert S.,Carcia Peter F.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4766731

Reference19 articles.

1. The impact of water vapor transmission rate on the lifetime of flexible polymer solar cells

2. Thin-Film Permeation-Barrier Technology for Flexible Organic Light-Emitting Devices

3. Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition

4. Atomic layer deposited Al2O3 as a capping layer for polymer based transistors

5. Encapsulation of pentacene/C60 organic solar cells with Al2O3 deposited by atomic layer deposition

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