Diffusion in intermetallic compounds with the CaF2structure: A marker study of the formation of NiSi2thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.331453
Reference18 articles.
1. Structure and growth kinetics of Ni2Si on silicon
2. Implanted noble gas atoms as diffusion markers in silicide formation
3. Influence of the nature of the Si substrate on nickel silicide formed from thin Ni films
4. Silicide formation in Ni-Si Schottky barrier diodes
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