Atomic hydrogen cleaning of InP(100): Electron yield and surface morphology of negative electron affinity activated surfaces
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1429796
Reference30 articles.
1. Low Temperature Surface Cleaning of InP by Irradiation of Atomic Hydrogen
2. Low energy Mott polarimetry of electrons from negative electron affinity photocathodes
3. Interaction of atomic hydrogen with native oxides on InP(100)
4. Atomic hydrogen cleaning of GaAs and InP surfaces studied by photoemission spectroscopy
5. In situ characterization of InP surfaces after low-energy hydrogen ion cleaning
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1. Review: Geometric interpretation of reflection and transmission RHEED patterns;Micron;2022-08
2. Atomic Imaging of Atomic H Cleaning of InGAs and InP for ALD;ECS Transactions;2011-04-25
3. Interfacial analysis of InP surface preparation using atomic hydrogen cleaning and Si interfacial control layers prior to MgO deposition;Applied Surface Science;2010-10
4. Effects of the Semiconductor Substrate Material on the Post-breakdown Current of MgO Dielectric Layers;ECS Transactions;2009-09-25
5. Activation energy of surface diffusion and terrace width dynamics during the growth of In(4×3) on Si(100)-(2×1) by femtosecond pulsed laser deposition;Journal of Applied Physics;2008-05
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