Development of x-ray reflectivity measurement system under N2 to prevent surface contamination-Reference-Cited by-同舟云学术

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Development of x-ray reflectivity measurement system under N2 to prevent surface contamination

Published:2020-07-01 Issue:7 Volume:91 Page:075112
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Azuma Yasushi¹^ORCID,Kurokawa Akira¹^ORCID

Affiliation:

1. Research Institute for Material and Chemical Measurement, National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Ibaraki 305-8565, Japan

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0008877

Reference19 articles.

1. Surface Studies of Solids by Total Reflection of X-Rays

2. Traceable thickness determination of organic nanolayers by X-ray reflectometry

3. Structure and density profile of diamond-like carbon films containing copper: Study by X-ray reflectivity, transmission electron microscopy, and spectroscopic ellipsometry

4. X-Ray Reflectometry of DMPS Monolayers on a Water Substrate

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental determination of reference intensity ratio essential for accurate thickness measurement of HfO₂ ultrathin films by XPS;Surface and Interface Analysis;2024-02-16

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