Characterization of carbon nitride deposition from CH4∕N2 glow discharge plasma beams using optical emission spectroscopy
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2953521
Reference16 articles.
1. Prediction of New Low Compressibility Solids
2. Characterization of DC Magnetron Sputtering Plasma Used for Deposition of Amorphous Carbon Nitride
3. Synthesis of nanocrystalline carbon nitride films by glow discharge plasma beam deposition
4. Production of intense atomic nitrogen beam used for doping and synthesis of nitride film
5. An arc discharge nitrogen atom source
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