Venting temperature determines surface chemistry of magnetron sputtered TiN films
Author:
Affiliation:
1. Thin Film Physics Division, Department of Physics (IFM), Linköping University, SE-581 83 Linköping, Sweden
2. Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen, Germany
Funder
Swedish Government Strategic research Area on Material Science
Deutsche Forschungsgemeinschaft (DFG)
Knut och Alice Wallenbergs Stiftelse (Knut and Alice Wallenberg Foundation)
VINNOVA (Swedish Governmental Agency for Innovation Systems)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4940974
Reference37 articles.
1. On structure and properties of sputtered Ti and Al based hard compound films
2. The development of the PVD coating TiAlN as a commercial coating for cutting tools
3. Comparison of cutting performance of ion-plated NbN, ZrN, TiN and (Ti, Al)N coatings
4. Titanium nitride coating for aero engine compressor gas path components
5. Diffusion barriers in thin films
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