A low temperature fabrication of HfO2 films with supercritical CO2 fluid treatment
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2844496
Reference21 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
3. Charge-trapping device structure of SiO2∕SiN∕high-k dielectric Al2O3 for high-density flash memory
4. Theoretical and experimental investigation of Si nanocrystal memory device with HfO/sub 2/ high-k tunneling dielectric
5. Dielectric properties of nanoscaleHfO2slabs
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