Sputtering of Metals with Low‐Energy Inert Gas Ions: Possible Influence of Trapped Gas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1656508
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1. Abtragraten und spezifische Energieverluste von 5,6 keV-Edelgasionen an Kieselglas;Zeitschrift für Naturforschung A;1972-02-01
2. Control of Film Properties by rf-Sputtering Techniques;Journal of Vacuum Science and Technology;1971-09
3. Re-emission of Sputtered SiO[2] During Growth and Its Relation to Film Quality;IBM Journal of Research and Development;1970-03
4. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets;Physical Review;1969-08-10
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