Measurement of valence-band offset at native oxide/BaSi2 interfaces by hard x-ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

Measurement of valence-band offset at native oxide/BaSi2 interfaces by hard x-ray photoelectron spectroscopy

Author:

Takabe Ryota¹,Du Weijie¹,Ito Keita¹²³,Takeuchi Hiroki¹,Toko Kaoru¹,Ueda Shigenori⁴⁵,Kimura Akio⁶,Suemasu Takashi¹⁷

Affiliation:

1. Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

2. Japan Society for the Promotion of Science (JSPS), Chiyoda, Tokyo 102-0083, Japan

3. Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan

4. Synchrotron X-ray Station at SPring-8, National Institute for Materials Science (NIMS), Hyogo 679-5148, Japan

5. Quantum Beam Unit, NIMS, Tsukuba, Ibaraki 305-0047, Japan

6. Graduate School of Science, Hiroshima University, Higashi-hiroshima 739-8526, Japan

7. Japan Science and Technology Agency, CREST, Tokyo 102-0075, Japan

Funder

Japan Society for the Promotion of Science (JSPS)

Japan Science and Technology Agency (JST)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference48 articles.

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