A new multi-line cusp magnetic field plasma device (MPD) with variable magnetic field
Author:
Affiliation:
1. Institute for Plasma Research, HBNI, Bhat, Gandhinagar, Gujarat 382428, India
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5007142
Reference39 articles.
1. Principles of Plasma Discharges and Materials Processing
2. I. Spalding, in Advances in Plasma Physics, edited by S. A. Simon and W. B. Thomson (Interscience, New York, 1971), Vol. 4, p. 79.
3. A Large Double Plasma Device for Plasma Beam and Wave Studies
4. Plasma containment in cusp-shaped magnetic fields
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