The evolution of 2D vdW ferroelectric materials: Theoretical prediction, experiment confirmation, applications

Author:

Wang Hong1ORCID,Tang Yusong1ORCID,Han Xu1ORCID,Yang Jialiang1ORCID,Zhang Xin1,Yan Xiaobing12ORCID

Affiliation:

1. Key Laboratory of Brain-Like Neuromorphic Devices and Systems of Hebei Province, Hebei Key Laboratory of Photo-Electricity Information and Materials, Hebei University 1 , Baoding 071002, China

2. Department of Materials Science and Engineering, National University of Singapore 2 , Singapore 117576, Singapore

Abstract

Since J. Valasek first discovered ferroelectric materials in 1920, researchers have been exploring continuously in various fields through theory and experiments. With the rapid development of the computing technology, energy efficiency and size requirements of semiconductor devices are becoming increasingly demanding. However, the conventional ferroelectric materials, which have been limited by physical size restrictions, can no longer satisfy the above requirements. Two-dimensional (2D) ferroelectric materials can effectively overcome the size limitation of traditional ferroelectrics due to the weak van der Waals force between layers, which is easy to thin while retaining their own unique properties. Currently, a small number of 2D materials have been proved to be ferroelectric properties by experiments and have shown great application potential in nanoscale electrical and optoelectronic devices, expected to become the leaders of next-generation computing. In this review, the current 2D ferroelectric materials are summarized and discussed in detail from seven aspects: theoretical prediction, fabrication methods, ferroelectric characterization methods, principles of typical 2D ferroelectrics, optimization methods of ferroelectric performance, application, and challenges. Finally, the development of 2D ferroelectric materials looks into the future.

Funder

National Key R&D Plan "Nano Frontier" Key Special Project

Science and Technology Project of Hebei Education Department

Publisher

AIP Publishing

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3