Effects of condensation reactions on the structural, mechanical, and electrical properties of plasma-deposited organosilicon thin films from octamethylcyclotetrasiloxane-Reference-Cited by-同舟云学术

Effects of condensation reactions on the structural, mechanical, and electrical properties of plasma-deposited organosilicon thin films from octamethylcyclotetrasiloxane

Published:2005-06 Issue:11 Volume:97 Page:113707
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Ross April D.,Gleason Karen K.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1923163

Reference39 articles.

1. Use of gas as low-k interlayer dielectric in LSI's: Demonstration of feasibility

2. Low Dielectric Constant Materials for ULSI Interconnects

3. Low-kSi–O–C–H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursor

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