Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2973179
Reference13 articles.
1. Ionized physical vapor deposition (IPVD): A review of technology and applications
2. Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion
3. A novel pulsed magnetron sputter technique utilizing very high target power densities
4. The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
5. Highly ionized fluxes of sputtered titanium atoms in high-power pulsed magnetron discharges
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