Extreme ultraviolet holographic lithography: Initial results-Reference-Cited by-同舟云学术

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Extreme ultraviolet holographic lithography: Initial results

Published:2007-01-08 Issue:2 Volume:90 Page:023116
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Cheng Yang-Chun¹,Isoyan Artak²,Wallace John²,Khan Mumit³,Cerrina Franco⁴

Affiliation:

1. Materials Science Program, University of Wisconsin-Madison, Wisconsin

2. Center for Nanotechnology, University of Wisconsin-Madison, Wisconsin

3. BRAC University, Bangladesh

4. Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Wisconsin

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference16 articles.

1. B. J. Lin, J. Microlithogr., Microfabr., Microsyst.JMMMGF1537-1646 5, 33005 (2006), and references therein.

2. H. Winick and S. Doniach, Synchrotron Radiation Research (Plenum, New York, 1982).

3. D. T. Attwood, Soft X-rays and Extreme Ultraviolet Radiation (Cambridge University Press, New York, 1999).

4. S.-H. Lee, P. Naulleau, K. A. Goldberg, C.-H. Cho, S.-T. Jeong, and J. Bokor, Appl. Opt.APOPAI0003-6935 40, 2655 (2001).

5. Sub-100 nm metrology using interferometrically produced fiducials

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