Magnetization reversal mechanisms in highly corrugated thin films

Abstract

Nanopatterned ferromagnetic (FM) thin films have specific characteristics that make them a workhorse for sensors based on magnonic, magnetoplasmonic, or anisotropic magneto-resistive effects. Undulated FM thin films have been studied because of their tunable uniaxial anisotropy. They have been traditionally understood by means of Schlömann's model taking account of shape-induced magnetic anisotropies in softly corrugated systems. Here, we show how it cannot describe accurately the magnetic behavior of highly corrugated FM systems within a thickness region of less than the ripple amplitude. We report on the magnetization reversal processes detected in Permalloy films deposited onto highly corrugated patterns (250 nm in periodicity, 180 nm in amplitude) in a wide thickness range (15–150 nm), finding both that the anisotropy of the system does not correspond to a uniaxial type for FM thicknesses larger than 40 nm and that the anisotropy of the system increases with the FM thickness. Based on the results, we hypothesize that whereas Schlömann's model is valid for softly corrugated thin films, it fails to explain magnetization reversal processes of highly corrugated thin films, especially when the ripple amplitude is much greater than the deposited FM layer thickness. By means of micromagnetic simulations, we find an increment of anisotropy with thickness, just as in the experimental, as well as determine the arise of magnetic domains at the ridges of high thickness corrugated FM thin films. This approach will help to get a better understanding of operating mechanisms in magnetic field sensors based on undulated ferromagnetic materials.