A transmission electron microscopy and X-ray photoelectron spectroscopy study of annealing induced γ-phase nucleation, clustering, and interfacial dynamics in reactively sputtered amorphous alumina thin films-Reference-Cited by-同舟云学术

A transmission electron microscopy and X-ray photoelectron spectroscopy study of annealing induced γ-phase nucleation, clustering, and interfacial dynamics in reactively sputtered amorphous alumina thin films

Published:2015-03-28 Issue:12 Volume:117 Page:125307
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Kumar A. K. Nanda¹,Prasanna S.²,Subramanian B.¹,Jayakumar S.³,Rao G. Mohan⁴^ORCID

Affiliation:

1. ECMS Division, Central Electro Chemical Research Institute, Karaikudi, India

2. Department of Physics, PSG College of Technology, Coimbatore, India

3. Department of Physics, PSG Institute of Technology and Applied Research, Coimbatore, India

4. Department of Instrumentation, Indian Institute of Science, Bangalore, India

Funder

Council of Scientific and Industrial Research (CSIR)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4916331

Reference48 articles.

1. Conversion of Diaspore to Corundum: A New α-Alumina Transformation Sequence

2. A new metastable alumina polymorph with monoclinic symmetry

3. Evidence for a Variable Long-range Order in Nearly Anhydrous Gamma Alumina

4. Cs promoted Ag/Al2O3 catalysts for selective catalytic reduction of NOx by methane: effect of SO2 and H2O

5. Rapid One-Step Low-Temperature Synthesis of Nanocrystalline γ-Al2O3

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