Ion sources for industrial applications (invited)-Reference-Cited by-同舟云学术

Ion sources for industrial applications (invited)

Published:1998-02 Issue:2 Volume:69 Page:863-867
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Ishikawa Junzo

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1148610

Reference5 articles.

1. Beam Formation and Space Charge Neutralisation

2. Ion species measurement of high current metal ion beams extracted from a multicusp ion source

3. Sputter Type HF Ion Source for Ion Beam Deposition Apparatus

4. J. Ishikawa, Application of Accelerators in Research and Industry, edited by J. L. Duggan and I. L. Morgan, AIP Conf. Proc. No. APCPCS392 (AIP, New York 1997), p. 915.

5. Energy Distribution and Yield Measurement of Secondary Electrons to Evaluate the Equilibrium Charging Voltage of an Isolated Electrode during Negative-Ion Implantation

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