Electron attachment to sulfur oxyhalides: SOF2, SOCl2, SO2F2, SO2Cl2, and SO2FCl attachment rate coefficients, 300

Electron attachment to sulfur oxyhalides: SOF2, SOCl2, SO2F2, SO2Cl2, and SO2FCl attachment rate coefficients, 300–900 K

Published:2010-06-07 Issue:21 Volume:132 Page:214302
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:The Journal of Chemical Physics

Author:

Miller Thomas M.,Friedman Jeffrey F.,Caples Connor M.,Shuman Nicholas S.,Van Doren Jane M.,Bardaro Michael F.,Nguyen Pho,Zweiben Cindy,Campbell Matthew J.,Viggiano A. A.

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3427527

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4. Transfer of F− in the reaction of SF 6 − with SOF4: Implications for SOF4 production in corona discharges

5. Rate constants for fluoride transfer from sulfur hexafluoride(1-) to fluorinated gases and sulfur dioxide: temperature dependence and implications for electrical discharges in sulfur hexafluoride

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