Growth of InGaAs/InP optical modulator structures by chemical beam epitaxy

Author:

Chiu T. H.,Goossen K. W.,Williams M. D.,Storz F. G.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Comparison of InGaAs(100) grown by chemical beam epitaxy and metal organic chemical vapor deposition;Applied Surface Science;2000-04

2. Quantum confined Stark effect near 1.5 μm wavelength in InAs0.53P0.47/GayIn1−yP strain-balanced quantum wells;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-05

3. Observation of 1.5 μm quantum confined Stark effect in InGaAs/AlGaAs multiple quantum wells on GaAs substrates;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-07

4. Molecular beam epitaxial growth of In0.65Ga0.35 As quantum wells on GaAs substrates for 1.5 μm exciton resonance;Journal of Crystal Growth;1994-08

5. As capture and the growth of ultrathin InAs layers on InP;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-07

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