Refractory metal silicide formation by ion beam mixing and rapid thermal annealing
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96059
Reference14 articles.
1. Reaction kinetics of tungsten thin films on silicon (100) surfaces
2. Reaction kinetics of molybdenum thin films on silicon (111) surface
3. Fabrication and Thermal Stability of W‐Si Ohmic Contacts
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