Estimation of electron temperature and density of the decay plasma in a laser-assisted discharge plasma extreme ultraviolet source by using a modified Stark broadening method
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3672816
Reference32 articles.
1. EUV Sources for Lithography
2. Progress in the ASML EUV program
3. Integrating Philips' extreme UV source in the alpha-tools
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1. Micro-pinch formation and extreme ultraviolet emission of laser-induced discharge plasma*;Chinese Physics B;2021-09-01
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3. Plasma dynamics in the initial stage of a laser-triggered discharge-plasma;Journal of Applied Physics;2018-12-07
4. Laser-Assisted Counter-Facing Plasma Focus Device as a Light Source for EUV Lithography;IEEE Transactions on Plasma Science;2017-05
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