Plasma nitridation process for the fabrication of all‐refractory Josephson junctions
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345432
Reference17 articles.
1. Selective niobium anodization process for fabricating Josephson tunnel junctions
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3. Tunneling characteristics of amorphous Si barriers
4. Partially oxidized amorphous silicon as the tunneling barrier for Josephson devices
5. Improved Nb-Si-Nb SNAP devices
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