Heat resistance of hydrogenated amorphous silicon films prepared by compressed magnetic field‐magnetron sputtering with He and Ar gases
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.336791
Reference8 articles.
1. Amorphous silicon solar cell
2. A new type of amorphous silicon photovoltaic cell generating more than 2.0 V
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4. Photoluminescence of hydrogenated amorphous silicon
5. (Invited) Optical, Electrical and Structural Properties of Plasma-Deposited Amorphous Silicon
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1. Preparation of piezoelectric ZnO thin films by target-facing-type sputtering method;Electronics and Communications in Japan (Part II: Electronics);2000
2. He/N2 reactive gas composition and the structural and electrical properties of InN thin films grown on A1N-nucleated (00.1) sapphire by planar magnetron sputtering;Thin Solid Films;1994-07
3. Annealing in a PbO atmosphere for highTcsuperconductivity of Bi‐Sr‐Ca‐Cu‐O films;Applied Physics Letters;1989-08-21
4. Preparation of Bi-Sr-Ca-Cu-O Thin Films by Sputtering under a Variable Magnetic Field;Journal of the American Ceramic Society;1989-04
5. Bi-Sr-Ca-Cu-O Compositional Modulation and Multilayered Film Synthesis by Plasma Controlled Sputtering;Science and Technology of Thin Film Superconductors;1989
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