A nonlinear global model of a dual frequency capacitive discharge
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2244525
Reference11 articles.
1. Dual excitation reactive ion etcher for low energy plasma processing
2. Influence of driving frequency on narrow-gap reactive-ion etching in SF6
3. Simulation of Capacitively Coupled Single- and Dual-Frequency RF Discharges
4. Ion energy distribution control in single and dual frequency capacitive plasma sources
5. Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
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