Etching characteristics of thin films of tungsten, amorphous silicon carbide, and SAL‐603 resist submitted to a surface‐wave driven SF6magnetoplasma near electron cyclotron resonance conditions
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.359484
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1. Travelling-wave-sustained discharges;Physics Reports;2007-05
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