Optimization of process parameters for the deposition of improveda‐Ge:H by dc magnetron sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.356180
Reference64 articles.
1. Use of hydrogenation in structural and electronic studies of gap states in amorphous germanium
2. Use of hydrogenation in structural and electronic studies of gap states in amorphous germanium
3. High photoconductivity in magnetron sputtered amorphous hydrogenated germanium films
4. Correlation between the structural and the electronic transport properties of sputtered hydrogenated amorphous germanium films
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