Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation-Reference-Cited by-同舟云学术

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Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation

Published:2009-07-15 Issue:2 Volume:106 Page:023302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Flege S.,Kraft G.,Bruder E.,Baba K.,Hatada R.,Ensinger W.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3176488

Reference29 articles.

1. Determination and Generation Mechanisms of Residual Stresses in Thin Films Produced by Physical Vapor Deposition Techniques

2. Adherent diamond-like carbon coatings on metals via plasma source ion implantation

3. Sheath thickness and potential profiles of ion‐matrix sheaths for cylindrical and spherical electrodes

4. Model of plasma immersion ion implantation

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tightly adhering diamond-like carbon films on copper substrates by oxygen pre-implantation;Surface and Coatings Technology;2018-02

2. Improved adhesion of DLC films on copper substrates by preimplantation;Surface and Coatings Technology;2014-10

3. Comparison of the Surface Modification of Tungsten and Gold by Methane Plasma Source Ion Implantation;IEEE Transactions on Plasma Science;2011-11

4. Methane plasma-based ion implantation of metallic and galvanically oxidized tantalum;Surface and Coatings Technology;2011-11

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