A hybrid electron cyclotron resonance metal ion source with integrated sputter magnetron for the production of an intense Al+ ion beam-Reference-Cited by-同舟云学术

A hybrid electron cyclotron resonance metal ion source with integrated sputter magnetron for the production of an intense Al+ ion beam

Published:2015-09 Issue:9 Volume:86 Page:093301
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Weichsel T.¹,Hartung U.¹,Kopte T.¹,Zschornack G.²,Kreller M.³,Philipp A.³

Affiliation:

1. Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, 01277 Dresden, Germany

2. Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden, Germany

3. DREEBIT GmbH, 01900 Grossroehrsdorf, Germany

Funder

European Fund for Regional Development of the European Union and the Freistaat Sachsen

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4929517

Reference34 articles.

1. Ion plasma sputtering as a method of introducing solid material into an electron cyclotron resonance ion source

2. Sputtering‐assisted production of multicharged boron ions from solid material in a 2.45 GHz electron cyclotron resonance source

3. An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources

4. R. Geller, Electron Cyclotron Resonance Ion Sources and ECR Plasmas (IOP Press, 1996), p. 434.

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