Oxygen and fluorine atom kinetics in electron cyclotron resonance plasmas by time‐resolved actinometry
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.349662
Reference22 articles.
1. Etch rate enhancement of photoresist in nitrogen‐containing plasmas
2. Plasma etching of organic materials. I. Polyimide in O2–CF4
3. Dry Etching of Polyimide in O 2 ‐ CF 4 and O 2 ‐ SF 6 Plasmas
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