Investigation for the structural stress of SiO2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Investigation for the structural stress of SiO2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor deposition

Published:2018-08 Issue:8 Volume:8 Page:085217
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Sun DeGui¹²^ORCID,Sun Qingyu¹,Xing Wenchao²,Sun Zheyu²^ORCID,Shang Hongpeng¹,Chang Liyuan¹,Wang Xueping¹,Liu Peng³,Hall Trevor³

Affiliation:

1. School of Science, Changchun University of Science and Technology, 7089 Weixing Road, Changchun, JL 130022, China

2. Jilin Sino-Microelectronics Co. Ltd, 99 Shenzhen Street, Jilin, JL 130031, China

3. Centre for Research in Photonics, University of Ottawa, 25 Templeton Street, Ottawa, ON K1N 6N5, Canada

Funder

Changchun University of Science and Technology

D&T Photonics Inc. with Nanjing 321 Grant

Jilin Provincial Department of Science and Technology

Jilin Sino-Microelectronics Co.Ltd

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5045516

Reference23 articles.

1. Silica-based single-mode waveguides on silicon and their application to guided-wave optical interferometers

2. Elastic relationships in layered composite media with approximation for the case of thin films on a thick substrate

3. Modeling of elastic deformation of multilayers due to residual stresses and external bending

4. Birefringence control in optical planar waveguides

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2. Study of Birefringence and Stress Distribution of SiO2 Film Optical Waveguide on Silicon Wafer;Coatings;2019-05-10

3. Preparation Process and Stress Study of Ge-doped Silica Film Waveguide;ACTA PHOTONICA SINICA;2018