Generation of an intense metal‐ion beam by a pulsed ion diode-Reference-Cited by-同舟云学术

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Generation of an intense metal‐ion beam by a pulsed ion diode

Published:1990-01 Issue:1 Volume:61 Page:529-531
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Nakagawa Yoshiro,Ariyoshi Takeshi

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1141241

Reference8 articles.

1. Electrochemical properties of ion-implanted metal electrodes

2. Production of high-current metal ion beams

3. On the Current Intensity Limit of a Vacuum-Arc Ion Source

4. Development of an intense pulsed metallic ion beam source

5. Ion beam annealing of semiconductors

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ionic diode;Technical Physics;2007-05

2. An Ion Diode with External Magnetic Insulation;Instruments and Experimental Techniques;2004-07

3. Pulse intense metal-ion diode with a vacuum arc plasma anode;IEEE Transactions on Plasma Science;1991

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