Thermal oxidation of silicides
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.334212
Reference20 articles.
1. Oxidation mechanisms in WSi2thin films
2. Kinetics of the thermal oxidation of WSi2
3. Oxidation of sputtered molybdenum silicide thin films
4. 1 µm MOSFET VLSI technology: Part VII—Metal silicide interconnection technology—A future perspective
Cited by 60 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Modeling passive/active transition in high-temperature dry oxidation of reaction-sintered SiC for innovative fuel matrix in high-temperature gas-cooled reactors;Journal of the European Ceramic Society;2024-05
2. Electronic Structure and Mechanical Properties of Ti5Si3;Journal of Experimental and Theoretical Physics;2022-06
3. Interaction of Oxygen with the Stable Ti5Si3 Surface;Metals;2022-03-14
4. High-temperature oxidation resistance and thermal stability of higher manganese silicide powder synthesized by pack cementation;Journal of Alloys and Compounds;2021-08
5. Oxidation behavior and chemical evolution of architecturally arranged Zr/Si multilayer at high temperature;Surface and Coatings Technology;2020-10
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3