Effective passivation of p- and n-type In0.53Ga0.47As in achieving low leakage current, low interfacial traps, and low border traps

Abstract

We have attained low leakage current, low interfacial traps, and low border traps by effectively passivating both p- and n-In0.53Ga0.47As (InGaAs) surfaces using the same gate dielectrics of ultra-high-vacuum deposited Al2O3/Y2O3. Gate leakage currents below 2 × 10−7 A/cm2 at gate fields of ±4 MV/cm were obtained after 800 °C rapid thermal annealing, demonstrating the intactness of the interface and heterostructure. Negligibly small frequency dispersions in the capacitance–voltage (C–V) characteristics of p- and n-type metal-oxide-semiconductor capacitors (MOSCAPs) were obtained from accumulation, flatband, to depletion as measured from 300 K to 77 K, indicative of low border and interfacial trap density; the C–V frequency dispersions in the accumulation region are 1.5%/dec (300 K) and 0.19%/dec (77 K) for p-InGaAs, and 2.2%/dec (300 K) and 0.97%/dec (77 K) for n-InGaAs. Very low interfacial trap densities (Dit's) of (1.7–3.2) × 1011 eV−1cm−2 and (6.7–8.5) × 1010 eV−1cm−2, as extracted from the conductance method, were achieved on p- and n-InGaAs MOSCAPs, respectively.