Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films-Reference-Cited by-同舟云学术

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Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films

Published:2018-08 Issue:8 Volume:89 Page:083902
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Takenaka Kosuke¹^ORCID,Setsuhara Yuichi¹,Han Jeon Geon²,Uchida Giichiro¹,Ebe Akinori³

Affiliation:

1. Joining and Welding Research Institute, Osaka University, Ibaraki, Osaka 567-0047, Japan

2. Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University, Suwon 440-746, South Korea

3. EMD Corporation, 2426-1 Mikami, Yasu, Shiga 520-2323, Japan

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5037408

Reference43 articles.

1. Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017

2. Large area roll-to-roll sputtering of transparent ITO/Ag/ITO cathodes for flexible inverted organic solar cell modules

3. Effect of the outgassed moisture from polymer substrate on the electrical properties of indium tin oxide thin films

4. Highly flexible InSnO electrodes on thin colourless polyimide substrate for high-performance flexible CH3NH3PbI3 perovskite solar cells

5. Growth and Physical Properties of LPCVD Polycrystalline Silicon Films

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent Advances in the Plasma-Assisted Synthesis of Silicon-Based Thin Films and Nanostructures;Coatings;2023-06-10

2. High-rate deposition of silicon nitride thin films using plasma-assisted reactive sputter deposition;Thin Solid Films;2019-09

3. Empirical expressions for the spectral dependence of the refractive index for the case of thin-film silicon and some of its common alloys;Journal of Materials Science: Materials in Electronics;2018-12-03

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