A stochastic model of solid state thin film deposition: Application to chalcopyrite growth-Reference-Cited by-同舟云学术

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A stochastic model of solid state thin film deposition: Application to chalcopyrite growth

Published:2016-04 Issue:4 Volume:6 Page:045015
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Lovelett Robert J.¹²^ORCID,Pang Xueqi¹²,Roberts Tyler M.¹²^ORCID,Shafarman William N.²³^ORCID,Birkmire Robert W.²³^ORCID,Ogunnaike Babatunde A.¹

Affiliation:

1. Department of Chemical and Biomolecular Engineering, University of Delaware, Newark, DE 19716, USA

2. Institute of Energy Conversion, University of Delaware, Newark, DE 19716, USA

3. Department of Materials Science and Engineering, University of Delaware, Newark, DE 19716, USA

Funder

National Science Foundation (NSF)

U.S. Department of Energy (DOE)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4948404

Reference27 articles.

1. Kinetics of Phase Change. I General Theory

2. Granulation, Phase Change, and Microstructure Kinetics of Phase Change. III

3. Reaction kinetics of α-CuInSe2 formation from an In2Se3/CuSe bilayer precursor film

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1. Low-temperature microstructural studies on superconducting CaFe2As2;Scientific Reports;2019-04-23

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