Negative ion densities in NF3 discharges
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.94731
Reference4 articles.
1. Comparison of the Etching and Plasma Characteristics of Discharges in CF 4 and NF 3
2. Numerical modeling of looped C-V Characteristics in Ap+n junction containing mid-bandgap electron traps
3. Laser optogalvanic photodetachment spectroscopy: A new technique for studying photodetachment thresholds with application to I−
4. Electron Photodetachment Cross Section of the Negative Ion of Fluorine
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3. A novel approach for negative ion analysis using 160 GHz microwave interferometry and laser photodetachment in oxygen cc-rf plasmas;Plasma Sources Science and Technology;2010-11-16
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