Electron attachment and positive ion chemistry of monohydrogenated fluorocarbon radicals
Author:
Affiliation:
1. Air Force Research Laboratory, Space Vehicles Directorate, Kirtland AFB, New Mexico 87117, USA
Funder
Air Force Office of Scientific Research (AFOSR)
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4928691
Reference42 articles.
1. Fundamental Electron Interactions with Plasma Processing Gases
2. Electron interactions with plasma processing gases: present status and future needs
3. Dissociative electron attachment to the highly reactive difluoromethylene molecule–importance of CF2for negative ion formation in fluorocarbon plasmas
4. Radical dynamics in unstable CF4 inductive discharges
5. Electron Interaction Cross Sections for CF3I, C2F4, and CFx (x=1–3) Radicals
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2. Kinetics of Cations with C2 Hydrofluorocarbon Radicals;The Journal of Physical Chemistry A;2017-10-13
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