Photochemistry of dimethylcadmium on compound semiconductor surfaces
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.473655
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1. Reactive ion etching of InP using CH4/H2 mixtures: Mechanisms of etching and anisotropy
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3. Photon assisted OMVPE growth of CdTe
4. The adsorption and thermal reaction of dimethylcadmium, dimethylzinc and trimethylgallium on GaAs(110)
5. Photolytic decomposition of adsorbed tellurium and cadmium alkyl species at 295 K upon 193 nm photon irradiation
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Studies of heteroepitaxial growth of thin II–VI semiconductor layers by sequential ultrahigh vacuum dosing;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-03
2. In Situ Investigation of the Surface Chemistry of Atomic-Layer Epitaxial Growth of II−VI Semiconductor Thin Films;Langmuir;1998-02-06
3. Low-temperature, chemically driven atomic-layer epitaxy:In situmonitored growth of CdS/ZnSe(100);Applied Physics Letters;1997-12-29
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