Laser-induced fine structures on silicon exposed to THz-FEL-Reference-Cited by-同舟云学术

Laser-induced fine structures on silicon exposed to THz-FEL

Published:2017-12-18 Issue:25 Volume:111 Page:251602
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Irizawa Akinori¹^ORCID,Suga Shigemasa¹,Nagashima Takeshi²,Higashiya Atsushi²,Hashida Masaki³,Sakabe Shuji³

Affiliation:

1. The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka , Ibaraki, Osaka 567–0047, Japan

2. Faculty of Science and Engineering, Setsunan University, 17-8 Ikeda-Nakamachi, Neyagawa, Osaka 572-8508, Japan

3. Advanced Research Center for Beam Science, Institute for Chemical Research, Kyoto University, Gokasho, Uji, Kyoto 611-0011, Japan and Department of Physics, Graduate School of Science, Kyoto University, Kitashirakawa, Sakyo, Kyoto 606-8502, Japan

Funder

MEXT | Japan Society for the Promotion of Science

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference19 articles.

1. Superhydrophobic surfaces fabricated by microstructuring of stainless steel using a femtosecond laser

2. Controlled nanostructrures formation by ultra fast laser pulses for color marking

3. Semiconductor Surface Damage Produced by Ruby Lasers

4. Periodic surface structures frozen into CO2 laser-melted quartz

5. Formation of nanogratings on the surface of a ZnSe crystal irradiated by femtosecond laser pulses

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