Investigation of voltage effect on reaction mechanisms in capacitively coupled N2 discharges-Reference-Cited by-同舟云学术

Investigation of voltage effect on reaction mechanisms in capacitively coupled N2 discharges

Published:2020-04-07 Issue:13 Volume:127 Page:133301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Liang Ying-Shuang¹²^ORCID,Liu Yong-Xin³^ORCID,Zhang Yu-Ru³^ORCID,Wang You-Nian³^ORCID

Affiliation:

1. School of Science, University of Science and Technology Liaoning, Anshan 114051, China

2. Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, BE-2610 Wilrijk-Antwerp, Belgium

3. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian 116024, China

Funder

China Scholarship Council

Natural Science Foundation of Liaoning Province

Key Laboratory of Materials Modification by Laser, Ion and Electron Beams

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5143821

Reference51 articles.

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2. Properties of an atmospheric pressure radio-frequency argon and nitrogen plasma

3. Density and temperature of N atoms in the afterglow of a microwave discharge measured by a two-photon laser-induced fluorescence technique

4. Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments

5. Spectroscopic diagnostics and modelling of a N2–Ar mixture discharge created by an RF helical coupling device: I. Kinetics of N2(B3Πg) and N2(C3Πu) states

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