A Fullerene derivative as an electron beam resist for nanolithography
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.120978
Reference12 articles.
1. Direct nanometer scale patterning of SiO2with electron beam irradiation through a sacrificial layer
2. Direct nanometer scale patterning of SiO2with electron beam irradiation through a sacrificial layer
3. Direct nanometer scale patterning of SiO2with electron beam irradiation through a sacrificial layer
4. Direct nanometer scale patterning of SiO2with electron beam irradiation through a sacrificial layer
5. Direct nanometer scale patterning of SiO2with electron beam irradiation through a sacrificial layer
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