A spatially resolved retarding field energy analyzer design suitable for uniformity analysis across the surface of a semiconductor wafer
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4870900
Reference20 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Ion energy distribution measurements in rf and pulsed dc plasma discharges
3. Investigation of atomic oxygen density in a capacitively coupled O2/SF6discharge using two-photon absorption laser-induced fluorescence spectroscopy and a Langmuir probe
4. Characterization of an asymmetric parallel plate radio-frequency discharge using a retarding field energy analyzer
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